Positive resist composition and method of forming resist...

Details Positive resist composition and method of forming resist... Positive resist composition and method of forming resist...

2007-03-20

2007-03-20

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S913000, C430S914000, C430S311000

Reexamination Certificate

active

10806451

ABSTRACT:
A positive resist composition comprising: (A) a fluorine atom-containing resin, wherein the resin comprises at least one group that increases a solubility of the resin in an alkali developer by the action of an acid; and (B) a sulfonium salt compound having a cation moiety, wherein the cation moiety contains at least one hydroxy group, and the sulfonium salt compound generates an acid upon irradiation with one of an actinic ray and a radiation.

REFERENCES:
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patent: WO 00/17712 (2000-03-01), None
European Search Report dated Aug. 17, 2004.

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