Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-07-11
2006-07-11
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000
Reexamination Certificate
active
07074543
ABSTRACT:
There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, whereinthe component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.
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Letter from Taiwan Patteny Attorney dated Jul. 6, 2004 regarding above communication.
Fujimura Satoshi
Hada Hideo
Iwai Takeshi
Kubota Naotaka
Miyairi Miwa
Bedi, Esq. Ben
Chu John S.
Dechert LLP
Tokyo Ohka Kogyo Co. Ltd.
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