Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-03-29
2011-03-29
Chu, John S (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000
Reexamination Certificate
active
07914968
ABSTRACT:
A positive resist composition including a resin component (A) and an acid-generator component (B), the resin component (A) including a structural unit (a1) derived from hydroxystyrene, and a structural unit (a2) having an acetal-type acid dissociable dissolution inhibiting group, and the acid-generator component (B) including an acid generator (B1-i) having at least one anion moiety selected from the group consisting of anion moieties represented by general formula (b-3), (b-4), and (b-5), an acid generator (B1-ii) having an anion moiety represented by general formula (b-6) shown below, or an acid generator (B1-iii) having a cation moiety represented by general formula (b′-3) shown below:wherein X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; Y″ and Z″, U″, V″, and W″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom,in-line-formulae description="In-line Formulae" end="lead"?[Chemical Formula 2]in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?R10″—SO3− (b-6)in-line-formulae description="In-line Formulae" end="tail"?wherein R10″ represents a hydrocarbon group which may or may not have a substituent,wherein R7″ to R9″ each independently represents a phenyl group or naphthyl group that may or may not have a substituent; with the proviso that the case where all of R7″ to R9″ represent phenyl groups which do not have a substituent is excluded.
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Kawaue Akiya
Mimura Takeyoshi
Takasu Ryoichi
Chu John S
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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