Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-07-17
2010-06-22
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S910000, C430S921000, C430S925000
Reexamination Certificate
active
07741009
ABSTRACT:
A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below:wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X2represents an acid dissociable, dissolution inhibiting group; and Y2represents an alkylene group or a divalent aliphatic cyclic group; andin-line-formulae description="In-line Formulae" end="lead"?R2—O—Y1—SO3−A+ (b1-12)in-line-formulae description="In-line Formulae" end="tail"?wherein R2represents a monovalent aromatic organic group; Y1represents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and A+represents a cation.
REFERENCES:
patent: 5548055 (1996-08-01), Narang et al.
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6180313 (2001-01-01), Yukawa et al.
patent: 6624328 (2003-09-01), Guerra
patent: 7074543 (2006-07-01), Iwai et al.
patent: 2004/0087690 (2004-05-01), Lamanna et al.
patent: 2007/0134588 (2007-06-01), Kanda et al.
patent: 2008/0311522 (2008-12-01), Iwai et al.
patent: 2009/0023095 (2009-01-01), Hada et al.
patent: H09-208554 (1997-08-01), None
patent: H11-35551 (1999-02-01), None
patent: H11-35552 (1999-02-01), None
patent: H11-35573 (1999-02-01), None
patent: 11-502543 (1999-03-01), None
patent: H11-322707 (1999-11-01), None
patent: 2003-241385 (2003-08-01), None
patent: 2006-348382 (2006-12-01), None
patent: WO 2004/074242 (2004-09-01), None
Ayothi et al (“Acrylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups”, Chemistry of Materials, (2007), vol. 19, issue 6, p. 1434-1444).
Dazai Takahiro
Hirahara Komei
Ohshita Kyoko
Shimizu Hiroaki
Knobbe Martens Olson & Bear LLP
Lee Sin J.
Tokyo Ohka Kogyo Co. Ltd.
LandOfFree
Positive resist composition and method of forming resist... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition and method of forming resist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition and method of forming resist... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4192300