Positive resist composition and method of forming resist...

Details Positive resist composition and method of forming resist... Positive resist composition and method of forming resist...

2011-07-05

2011-07-05

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000

Reexamination Certificate

active

07972762

ABSTRACT:
Provided are a positive resist composition and a resist pattern forming method having fewer defects and superior lithographic characteristics. The positive resist composition includes a resin component (A) which has on a main chain a structural unit derived from an (α-lower alkyl)acrylate ester and exhibits increased alkali solubility under the action of an acid, and an acid generating component (B) which generates the acid upon irradiation with radiation, in which the resin component (A) is a copolymer having at least two structural units which is obtained by incorporating an acid when polymerizing at least one monomer for the production thereof.

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Office Action issued in corresponding Taiwan Patent Application No. 095115905, dated Jun. 9, 2009.
International Search Report in Corresponding PCT Application No. PCT/JP2006/308693, dated May 23, 2006.

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