Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-06-17
2011-10-04
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S910000
Reexamination Certificate
active
08029968
ABSTRACT:
A positive resist composition with a broad DOF and a method for resist pattern formation are provided. This composition is a positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, wherein the component (A) is a copolymer that contains n [wherein, n is an integer from4to6] structural units with mutually different structures, and the proportion of each structural unit within the copolymer is greater than 0 mol % but no higher than 100/(n−1) mol %.
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Office Action issued on Jun. 24, 2008, on the counterpart Japanese Application No. 2004-196567.
Hayashi Ryotaro
Irie Makiko
Yamada Satoshi
Chu John
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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