Positive resist composition and method for resist pattern...

Details Positive resist composition and method for resist pattern... Positive resist composition and method for resist pattern...

2006-01-25

2009-12-29

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000

Reexamination Certificate

active

07638258

ABSTRACT:
A positive resist composition includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the resin component (A) is a mixture of a copolymer (A1) that includes a structural unit (a1) derived from an acrylate ester that contains an acid-dissociable, dissolution-inhibiting group, a structural unit (a2) derived from a methacrylate ester that contains a lactone-containing monocyclic group, and a structural unit (a3) derived from an acrylate ester that contains a polar group-containing polycyclic group, and a copolymer (A2) that has a different structure from the copolymer (A1) and has a lower hydrophilicity than the copolymer (A1).

REFERENCES:
patent: 6579659 (2003-06-01), Uetani et al.
patent: 7074543 (2006-07-01), Iwai et al.
patent: 2004/0058269 (2004-03-01), Hada et al.
patent: 2004/0137378 (2004-07-01), Sugeta et al.
patent: 2006/0099347 (2006-05-01), Sugeta et al.
patent: 2000-267269 (2000-09-01), None
patent: 2003-005374 (2003-01-01), None
patent: 2005-010488 (2005-01-01), None
International Search Report from PCT/JP2006/301127 dated Feb. 21, 2006.

Affiliated with

Also associated with

Rating

Positive resist composition and method for resist pattern... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition and method for resist pattern..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition and method for resist pattern... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4129608