Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-06-19
2007-06-19
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C524S303000
Reexamination Certificate
active
11137164
ABSTRACT:
A positive resist composition includes a resin component (A) which contains an acid dissociable dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and a compound (C) represented by a general formula (1) shown below:(wherein, each R1group and each R3group represents, independently, a hydrogen atom, an alkyl group of 1 to 3 carbon atoms, or a cycloalkyl group of 4 to 6 carbon atoms, provided at least one of the R1and R3groups is a cycloalkyl group of 4 to 6 carbon atoms, n represents an integer from 1 to 3, R2represents an alkyl group of 1 to 3 carbon atoms, and X represents an alkylene group of either 4 or 5 carbon atoms).
REFERENCES:
patent: 5216135 (1993-06-01), Urano et al.
patent: 6492542 (2002-12-01), Miyagi et al.
patent: 6603029 (2003-08-01), Shiomi et al.
patent: 2002/0045123 (2002-04-01), Okubo et al.
patent: 0 709 736 (1996-05-01), None
patent: 4-211258 (1992-08-01), None
patent: 2006-206484 (2006-08-01), None
patent: WO 2006046383 (2006-05-01), None
European Search Report from corresponding European Patent Application Serial No. EP 05 10 4527.
Knobbe Martens Olson and Bear LLP
Walke Amanda
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