Positive resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S322000

Reexamination Certificate

active

08080362

ABSTRACT:
A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

REFERENCES:
patent: 6489080 (2002-12-01), Uenishi et al.
patent: 6537718 (2003-03-01), Nishiyama et al.
patent: 6605409 (2003-08-01), Kodama et al.
patent: 6630280 (2003-10-01), Fujimori et al.
patent: 6656660 (2003-12-01), Urano et al.
patent: 6756179 (2004-06-01), Fujimori et al.
patent: 6806023 (2004-10-01), Kanna et al.
patent: 2001/0008739 (2001-07-01), Nishiyama et al.
patent: 2001/0055726 (2001-12-01), Kanna et al.
patent: 2002/0015916 (2002-02-01), Uenishi et al.
patent: 2002/0058200 (2002-05-01), Fujimori et al.
patent: 2002/0155383 (2002-10-01), Fujimori et al.
patent: 2003/0134225 (2003-07-01), Fujimori et al.
patent: 2-19847 (1990-01-01), None
patent: 4-219757 (1992-08-01), None
patent: 9-319092 (1997-12-01), None
patent: 10-221854 (1998-08-01), None
patent: 11-305443 (1999-11-01), None
patent: 2000-338677 (2000-10-01), None
patent: 2002-49156 (2002-02-01), None
patent: 2002-323768 (2002-11-01), None
Fujimori et al., “Structural Design of a New Class of Acetal Polymer for DUV resists.”, Proceedings of SPIE, vol. 3999, (Published in 2000), pp. 579-590.
Manako et al., “Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography”, Japanese Journal of Applied Physics, vol. 36 (1997), pp. L 724-L 726, Part 2, No. 6A, Jun. 1, 1997.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4307621

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.