Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-03-28
2008-08-26
Lee, Sin (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S914000, C430S919000
Reexamination Certificate
active
07416832
ABSTRACT:
A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which are dissolved in an organic solvent, wherein the base resin component (A) is a silicone resin, and the organic solvent contains propylene glycol monomethyl ether (x1) and a solvent (S2) having a boiling point higher than that of the propylene glycol monomethyl ether.
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Office action in the counterpart Chinese Application No. 200510062425.6, dated Mar. 14, 2008.
Hosono Takayuki
Kawana Daisuke
Tamura Koki
Yamada Tomotaka
Knobbe Martens Olson & Bear LLP
Lee Sin
Tokyo Ohka Kogyo Co. Ltd.
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