Positive resist composition

Details Positive resist composition Positive resist composition

2004-03-26

2008-03-04

Walke, Amanda C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

07338740

ABSTRACT:
A positive resist composition comprising (A) a resin comprising at least one kind of acrylate derivative repeating units, repeating units having lactone structures and repeating units having hydroxy group-substituted adamantane structures, having a glass transition temperature in the range of 70 to 155° C. and capable of increasing its solubility in an alkali developer under action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) an organic solvent.

REFERENCES:
patent: 6753124 (2004-06-01), Nishimura et al.
patent: 6787282 (2004-09-01), Sato
patent: 2005/0095532 (2005-05-01), Kodama et al.
patent: 1179750 (2002-02-01), None
patent: 10-254139 (1998-09-01), None
patent: 2001-142212 (2001-05-01), None
patent: 2002-229192 (2002-08-01), None

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