Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-08-28
2007-08-28
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S921000, C430S914000
Reexamination Certificate
active
11091617
ABSTRACT:
A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin and the acid generator component (B) contains an onium salt-based acid generator (B1) containing a perfluoroalkyl sulfonate ion having 3 or 4 carbon atoms as an anion.
REFERENCES:
patent: 5032636 (1991-07-01), Ono et al.
patent: 5691396 (1997-11-01), Takemura et al.
patent: 5731126 (1998-03-01), Takemura et al.
patent: 5776652 (1998-07-01), Eichhorn et al.
patent: 6066433 (2000-05-01), Takemura et al.
patent: 6479210 (2002-11-01), Kinoshita et al.
patent: 6939664 (2005-09-01), Huang et al.
patent: 6969577 (2005-11-01), Adegawa
patent: 2002/0168581 (2002-11-01), Takeda et al.
patent: 2003/0099899 (2003-05-01), Gronbeck et al.
patent: 2003/0138727 (2003-07-01), Kawabe et al.
patent: 2004/0229161 (2004-11-01), Yasunami et al.
patent: 2004/0253535 (2004-12-01), Cameron et al.
patent: 2006/0003252 (2006-01-01), Hirayama et al.
patent: 1033624 (2000-09-01), None
patent: 1457822 (2004-09-01), None
patent: 1 643 307 (2006-04-01), None
patent: 04-130324 (1992-05-01), None
patent: 2001-51422 (2001-02-01), None
patent: WO-02082185 (2002-10-01), None
patent: WO-2004/111734 (2004-12-01), None
Dow Corning, “Silicone Chemistry Overview” 12 page brochure dated 1997, Dow Corning Corporation, Midland ,Michigan, downloaded from http://www.dowcorning.com/content/webabstract/ABS—51-960A-01.asp?DCWS=Paints%20and%20Inks&DCWSS=Resins%20and%20Binders on Jul. 13, 2006.
Hosono Takayuki
Kawana Daisuke
Tamura Koki
Yamada Tomotaka
Hamilton Cynthia
Knobbe Martens Olson and Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
LandOfFree
Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3874839