Positive resist composition

Details Positive resist composition Positive resist composition

2006-12-05

2006-12-05

Lee, Sin J. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000

Reexamination Certificate

active

07144674

ABSTRACT:
The present invention provides a positive resist composition comprising(A) at least one resin selected from the group consisting of{circle around (1)} resin which is itself insoluble or poorly soluble in an alkali aqueous solution but cause a chemical change by the action of an acid to become soluble in an alkali aqueous solution with a proviso that the resin is not novolak resin and{circle around (2)} alkali-soluble resin,(B) novolak resin containing protective group which can be dissociated by the action of an acid and(C) an acid generator.

REFERENCES:
patent: 6365321 (2002-04-01), Chen et al.
patent: 6511785 (2003-01-01), Takemura et al.
patent: 6692888 (2004-02-01), Barclay et al.
patent: 2003/0113658 (2003-06-01), Ebata et al.
patent: 2004/0005506 (2004-01-01), Nishimura et al.
Schlegel et al (“Determination of Acid Diffusion in Chemical Amplification Positive Deep Ultraviolet Resists”, Journal of Vacuum Science and Technology, B, vol. 9 (2), 1991, p. 278-289.).

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