Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-09-12
2006-09-12
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000
Reexamination Certificate
active
07105273
ABSTRACT:
A positive resist composition of the present invention achieving significant performance improvements in high energy-beam lithography, which comprises a phenolic polymer having a property of being insoluble or hardly soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by the action of an acid, in which the phenolic polymer includes a repeating unit containing at least one selected from the group consisting of an acetal-protected phenolic hydroxyl group, a ketal-protected phenolic hydroxyl group, a tertiary ester-protected carboxyl group and a tetrahydropyranyl-protected carboxyl group; and a compound having a phenacylsulfonium structure and capable of generating an acid upon irradiation with one of actinic rays and radiation.
REFERENCES:
patent: 6692884 (2004-02-01), Fujimori et al.
patent: 6733951 (2004-05-01), Kodama
patent: 2002/0182535 (2002-12-01), Maeda et al.
patent: 2003/0224288 (2003-12-01), Kodama
patent: 2005/0019689 (2005-01-01), Kodama
patent: 2005/0142484 (2005-06-01), Watanabe et al.
patent: 2-19847 (1990-01-01), None
patent: 4-211258 (1992-08-01), None
patent: 4-219757 (1992-08-01), None
patent: 2000-292917 (2000-10-01), None
patent: 2001-294570 (2001-10-01), None
Mizutani Kazuyoshi
Takahashi Hyou
Yasunami Shoichiro
Chu John S.
Fuji Photo Film Co. , Ltd.
Sughrue & Mion, PLLC
LandOfFree
Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3620474