Positive resist composition

Details Positive resist composition Positive resist composition

2005-05-17

2005-05-17

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000

Reexamination Certificate

active

06893792

ABSTRACT:
The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

REFERENCES:
patent: 6548219 (2003-04-01), Ito et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 6692887 (2004-02-01), Suwa et al.
patent: 6710148 (2004-03-01), Harada et al.
patent: 6720129 (2004-04-01), Lee et al.
patent: 20030082479 (2003-05-01), Hatekeyama et al.
patent: 20030148213 (2003-08-01), Kaneko et al.
patent: 20030152864 (2003-08-01), Araki et al.
patent: 20030157432 (2003-08-01), Rottstegge

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3370190