Positive resist composition

Details Positive resist composition Positive resist composition

1996-10-29

1999-09-21

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, 430905, G03F 7004

Patent

active

059552409

ABSTRACT:
Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aqueous solution is increased by the action of acids, (B) a chemical compound which generates an acid when exposed to radiations, and (C) an organic carboxylic acid compound and (D) an amine, in which said resin component (A) is a mixture comprising (a) a polyhydroxystyrene having a weight-average molecular weight of from 8,000 to 25,000 and a molecular weight distribution (Mw/Mn) of 1.5 or less where from 10 to 60 mol % of the hydroxyl groups have been substituted by residues of a general formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a methyl group or an ethyl group, and R.sup.3 represents a lower alkyl group having 1 to 4 carbon atoms;
and (b) a polyhydroxystyrene having a weight-average molecular weight of from 8,000 to 25,000 and a molecular weight distribution (M.sub.w /M.sub.n) of 1.5 or less where from 10 to 60 mol % of the hydroxyl groups have been substituted by tert-butoxycarbonyloxy groups. The composition has a high sensitivity, a high resolution, high heat resistance, good width characteristic in focus depth and good post-exposure storage stability, has good storage stability as a resist solution, and gives resist patterns with good profiles, without depending on the substrate to which it is applied. The composition is useful for forming fine patterns in producing ultra-LSIs.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5069997 (1991-12-01), Schwaim et al.
patent: 5118585 (1992-06-01), Schwaim et al.
patent: 5229254 (1993-07-01), Lohaus et al.
patent: 5314786 (1994-05-01), Roechert et al.
patent: 5314931 (1994-05-01), Yamada et al.
patent: 5318876 (1994-06-01), Schwalm et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5374500 (1994-12-01), Carpenter et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5412050 (1995-05-01), Watanabe et al.
patent: 5468589 (1995-11-01), Urano et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5558976 (1996-09-01), Urnao et al.
patent: 5558978 (1996-09-01), Schadeli et al.
patent: 5627006 (1997-05-01), Urano et al.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-78759