Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-03-12
1993-06-08
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430306, 430315, 430326, 522 65, G03C 1492
Patent
active
052178439
ABSTRACT:
A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.
REFERENCES:
patent: 3615455 (1971-10-01), Laridon et al.
patent: 3686084 (1972-08-01), Rosenkranz et al.
patent: 3912606 (1975-10-01), Pacifici et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4243957 (1981-02-01), Sander et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4398001 (1983-08-01), Cheng et al.
patent: 4457999 (1984-07-01), Stahlhofen
patent: 4458000 (1984-07-01), Stahlhofen
patent: 4506006 (1985-03-01), Ruckert
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4699867 (1987-10-01), Schneller et al.
patent: 4752552 (1988-06-01), Aoai
patent: 4816375 (1989-03-01), Aoai
patent: 4820607 (1989-04-01), Aoai
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 4853314 (1989-08-01), Ruckert et al.
Taylor, "X-Ray Resist Trends," Solid State Technology, Jun. 1984, pp. 124-131.
Yamaoka et al., "Crosslinking of Polymers with Irradiating Rh, L.sub..alpha. X Ray-Effect of Active Groups and a Heavy Atom on Crosslinking," Photographic Science and Engineering, vol. 23, No. 4, Jul./Aug. 1979, pp. 196-202.
Bowden et al., "A Sensitive Novolac-Based Positive Electron Resist," J. Electrochem. Soc.: Solid-State Science and Technology, Jun. 1981, pp. 1304-1312.
Dammel Ralph
Lingnau Juergen
Pawlowski Georg
Theis Juergen
Brammer Jack P.
Hoechst Aktiengesellschaft
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