Positive photosensitive resin composition

Details Positive photosensitive resin composition Positive photosensitive resin composition

2008-05-13

2008-05-13

Walke, Amanda (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S913000

Reexamination Certificate

active

07371506

ABSTRACT:
A positive photosensitive resin composition comprising (A) a polyamic acid, (B) a 1,4-dihydropyridine derivative represented by the general formula (II):wherein R2is a monovalent organic group; each of R3, R4, R5, and R6is independently hydrogen or a monovalent organic group; and Ar—NO2is an aromatic hydrocarbon group having a nitro group at ortho-position, and (C) an amine compound.

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English language machine translation of JP 2001-022063.

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