Positive photosensitive composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S910000, C430S326000, C430S311000

Reexamination Certificate

active

07977029

ABSTRACT:
A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

REFERENCES:
patent: 6027854 (2000-02-01), Nishi et al.
patent: 6180316 (2001-01-01), Kajita et al.
patent: 6239231 (2001-05-01), Fujishima et al.
patent: 6274286 (2001-08-01), Hatakeyama et al.
patent: 6280898 (2001-08-01), Hasegawa et al.
patent: 6338931 (2002-01-01), Maeda et al.
patent: 6340553 (2002-01-01), Oomori et al.
patent: 6399274 (2002-06-01), Kinsho et al.
patent: 6403280 (2002-06-01), Yamahara et al.
patent: 6413695 (2002-07-01), Nishi et al.
patent: 6416928 (2002-07-01), Ohsawa et al.
patent: 6440634 (2002-08-01), Ohsawa et al.
patent: 6475693 (2002-11-01), Susikida et al.
patent: 6485887 (2002-11-01), Oomori et al.
patent: 6506535 (2003-01-01), Mizutani et al.
patent: 6514664 (2003-02-01), Touky et al.
patent: 6517991 (2003-02-01), Kodama et al.
patent: 6537726 (2003-03-01), Nakanishi et al.
patent: 6544715 (2003-04-01), Sato et al.
patent: 6667145 (2003-12-01), Nishi et al.
patent: 6673511 (2004-01-01), Hatakeyama et al.
patent: 6692897 (2004-02-01), Fujimori et al.
patent: 6753124 (2004-06-01), Nishimura et al.
patent: 6800414 (2004-10-01), Nishimura et al.
patent: 6808860 (2004-10-01), Sato et al.
patent: 6852466 (2005-02-01), Trefonas, III et al.
patent: 2001/0003772 (2001-06-01), Hatakeyama et al.
patent: 2001/0033990 (2001-10-01), Hatakeyama et al.
patent: 2001/0044070 (2001-11-01), Uetani et al.
patent: 2002/0009667 (2002-01-01), Nishimura et al.
patent: 2002/0031722 (2002-03-01), Oomori et al.
patent: 2002/0098440 (2002-07-01), Sato et al.
patent: 2003/0077540 (2003-04-01), Kodama et al.
patent: 2003/0077543 (2003-04-01), Sato
patent: 2003/0157428 (2003-08-01), Trefonas, III et al.
patent: 0789278 (1997-08-01), None
patent: 0793144 (1997-09-01), None
patent: 0901043 (1999-03-01), None
patent: 0952489 (1999-10-01), None
patent: 1014193 (2000-06-01), None
patent: 1024406 (2000-08-01), None
patent: 1041442 (2000-10-01), None
patent: 1048983 (2000-11-01), None
patent: 1085379 (2001-03-01), None
patent: 1091248 (2001-04-01), None
patent: 1096317 (2001-05-01), None
patent: 1120689 (2001-08-01), None
patent: 1126322 (2001-08-01), None
patent: 1132774 (2001-09-01), None
patent: 1162506 (2001-12-01), None
patent: 1031879 (2002-08-01), None
patent: 1231205 (2002-08-01), None
patent: 1260864 (2002-11-01), None
patent: 1267210 (2002-12-01), None
patent: 2373867 (2002-10-01), None
patent: 10-111569 (1998-04-01), None
patent: 10-298236 (1998-11-01), None
patent: 10-324748 (1998-12-01), None
patent: 11-265067 (1999-09-01), None
patent: 11-305444 (1999-11-01), None
patent: 2000-47386 (2000-02-01), None
patent: 2000-159758 (2000-06-01), None
patent: 2000-298348 (2000-10-01), None
patent: 2000-330283 (2000-11-01), None
patent: 2000-347405 (2000-12-01), None
patent: 2001-013688 (2001-01-01), None
patent: 2001-051419 (2001-02-01), None
patent: 2001-66779 (2001-03-01), None
patent: 2001-122850 (2001-05-01), None
patent: 2001-125258 (2001-05-01), None
patent: 2001-125270 (2001-05-01), None
patent: 2001-125271 (2001-05-01), None
patent: 2001-125272 (2001-05-01), None
patent: 2001-142213 (2001-05-01), None
patent: 2001-142215 (2001-05-01), None
patent: 2001-235863 (2001-08-01), None
patent: 2001-330959 (2001-11-01), None
patent: 2002-062657 (2002-02-01), None
patent: 2003-113213 (2003-04-01), None
patent: 2003-147023 (2003-05-01), None
patent: 00-34829 (2000-06-01), None
patent: 02/08834 (2002-01-01), None
Partial Search Report dated Sep. 1, 2003.
European Search Report dated Dec. 12, 2003.
Office Action dated Dec. 14, 2010 in JP Application No. 2008-198286.
Office Action dated Dec. 14, 2010 in JP Application No. 2008-198285.

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