Positive photosensitive composition

Details Positive photosensitive composition Positive photosensitive composition

1997-06-04

1999-08-31

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430914, 430917, 430919, 430921, 522 31, B03C 1492, C08F 246

Patent

active

059452501

ABSTRACT:
A photosensitive composition containing a sulfonium or iodonium salt resin having a specific repeating structural units has good solubility in solvents and high photosensitivity, are capable of giving an excellent resist pattern, and change little with time after exposure.

REFERENCES:
patent: 4650734 (1987-03-01), Molaire et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 5346803 (1994-09-01), Crivello et al.
patent: 5550004 (1996-08-01), Honda
Lamola, A.A., et al, Chemically Amplified Resists, Solid State Technology, Aug. 1991, pp. 53-60.

Affiliated with

Also associated with

Rating

Positive photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photosensitive composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2426263