Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-03-30
2000-03-14
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430914, 430921, 430922, C08F 250
Patent
active
06037098&
ABSTRACT:
Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and a compound represented by formula (Ia) or (Ib) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.3 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.4, where R.sub.4 represents an alkyl group or an aryl group; X.sup.- represents the specific anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid; and l, m, and n represents an integer of 1 to 3.
REFERENCES:
patent: 5693452 (1997-12-01), Aoai et al.
patent: 5731364 (1998-03-01), Sinta et al.
Derwent and EP patent office esp@cenet English Abstracts of JP 6-199770.
"Complex triarylsulfonium salts as photoacid generators for deep UV microlithography", Cameron, J.F., et al. SPIE 3049, 1997, 473-483.
Aoai Toshiaki
Takita Satoshi
Ashton Rosemary
Baxter Janet
Fuji Photo Film Co. , Ltd.
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