Positive photoresist with an alkoxyalkyl ester group-containing

Details Positive photoresist with an alkoxyalkyl ester group-containing Positive photoresist with an alkoxyalkyl ester group-containing

1996-11-27

1999-08-17

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430323, 4302701, 430326, 430910, G03C 516, G03C 173

Patent

active

059392428

ABSTRACT:
Positive photoresist compositions which can be developed in aqueous-alkaline media, comprising

REFERENCES:
patent: 5120633 (1992-06-01), Bauer et al.
patent: 5252427 (1993-10-01), Bauer et al.
patent: 5262281 (1993-11-01), Bauer et al.
patent: 5369200 (1994-11-01), Schadeli et al.
patent: 5397680 (1995-03-01), Schadeli et al.
patent: 5482816 (1996-01-01), Murata et al.
English Translation of JP 4-26850 Mayashi et al, Jan. 30, 1992.
Patent Abstracts of Japan, vol. 17, No. 291 JP 5017711, Jan. 1993.

Affiliated with

Also associated with

Rating

Positive photoresist with an alkoxyalkyl ester group-containing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist with an alkoxyalkyl ester group-containing , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist with an alkoxyalkyl ester group-containing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-314045