Positive photoresist composition containing photoacid generator

Details Positive photoresist composition containing photoacid generator Positive photoresist composition containing photoacid generator

1993-04-02

1994-12-20

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430277, 430905, 430910, 430914, 522 25, 522 26, C03C 1492, G03F 7039

Patent

active

053745000

ABSTRACT:
A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.

REFERENCES:
patent: 4510230 (1985-04-01), Coveleskie et al.
patent: 4579811 (1986-04-01), Schell et al.
patent: 4686171 (1987-08-01), Fifield et al.
patent: 5041358 (1991-08-01), Hatzakis et al.
patent: 5045431 (1991-09-01), Allen et al.
patent: 5055439 (1991-10-01), Allen et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5198402 (1993-03-01), Kaji et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5279923 (1994-01-01), Hiro et al.
Chemical Mater., vol. 3, No. 3, (1991), pp. 2-4.

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