Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-01-27
1996-06-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430193, G03F 7023
Patent
active
055231918
ABSTRACT:
There are disclosed novel photoresist compositions employing phosphazene compounds as ballast, unabsorbent of light at a band of i-line and g-line and superior in thermal resistance and sensitivity as well as resolution, characterized by introducing photosensitive groups into phosphazene type ballast represented by the following formula I: ##STR1##
REFERENCES:
Ahn et al., Journal of Photopolymer Science & Technology, vol. 5, No. 1, 1992, pp. 67-77.
Kim Ki-Dae
Kim Seong-Ju
Lee Dae Y.
Lee Hosull
Bowers Jr. Charles L.
Korea Kumho Chemical Co., Ltd.
Young Christopher G.
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