Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-01-10
2000-12-05
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430905, 430910, G03C 1492
Patent
active
061564761
ABSTRACT:
The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.
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Partial Translation of Japanese Patent Application No. 5-197154 (Pub Aug. 1993).
C.A. Spence et al., Silylation of poly (t-BOC) Syrene Resists Advances in Resist Technology and Processing VII, vol. 1262, pp. 344-357 (1990).
Database Inspec Institute of Electrical Engineers, Stevenage, GB Inspec No. 4369457, Abstract of Kawai et al. 5th (4th International) Microprocess Conference (MPC 92), Kawasaki Japan, Jul. 13-16 1992.
Kusumoto Takehiro
Nakano Yuko
Takeyama Naoki
Ueda Yuji
Ueki Hiromi
Dote Janis L.
Sumitomo Chemical Company Limited
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