Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1986-05-28
1988-05-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
252156, 252528, 252529, 252541, 252547, 252548, 430149, 430154, 430309, 430325, 430326, G03C 500, G03C 534
Patent
active
047419890
ABSTRACT:
A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.
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Patent Abstract of Japan, vol. 6, No. 209 (P-150) [1087], Oct. 21, 1982, of JPA-57-114141.
Ichikawa Ichiro
Niwa Kenji
Bowers Jr. Charles L.
Sumitomo Chemical Company Limited
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