Positive image-forming process utilizing glass substrate with ox

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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Details

430166, 430191, 430275, 430323, 430326, G03F 730, G03F 740

Patent

active

053087437

ABSTRACT:
A positive-type photoresist composition is disclosed, which comprises:

REFERENCES:
patent: 4271251 (1981-06-01), Aotani et al.
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4853314 (1989-08-01), Ruckert et al.
patent: 4963463 (1990-10-01), Koshiba et al.

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