Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1992-03-06
1994-05-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430166, 430191, 430275, 430323, 430326, G03F 730, G03F 740
Patent
active
053087437
ABSTRACT:
A positive-type photoresist composition is disclosed, which comprises:
REFERENCES:
patent: 4271251 (1981-06-01), Aotani et al.
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4853314 (1989-08-01), Ruckert et al.
patent: 4963463 (1990-10-01), Koshiba et al.
Kobayashi Kesanao
Matsuda Nobuaki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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