Positive developer containing non-ionic surfactants

Details Positive developer containing non-ionic surfactants Positive developer containing non-ionic surfactants

1981-07-27

1983-02-22

Smith, John D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430309, G03C 524

Patent

active

043749208

ABSTRACT:
A developer composition for positive working lithographic printing plates and photoresists comprising an aqueous alkaline solution with a non-ionic surfactant.

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patent: 4308340 (1981-12-01), Walls
Schick, "Non-Ionic Surfactants," Marcel Dekker, Inc., N.Y., c 1967, pp. 413-414.
Chemical Abstracts, 186365q Presensitized Photolithographic Printing Plates, Wade, John E., vol. 83, 1975, p. 491.
Chemical Abstracts, 99071j Liquid Developers for Lithographic Photosensitive Plates Containing Diazo Compound, Matsumoto, Hiroshi, vol. 86, 1977, p. 649.
Chemical Abstracts, 44133x Developers for Diazo-Sensitized Lithographic Plates, Rowe, William, vol. 81, 1974.
Chemical Abstracts, 170917k Developer for Photosensitive Lithographic Plates Containing o-Quinonediazide Compounds, Watanabe, Masaru, vol. 83, 1975, p. 458.

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