Positioning apparatus, atmosphere substituting method,...

Details Positioning apparatus, atmosphere substituting method,... Positioning apparatus, atmosphere substituting method,...

2006-01-24

2006-01-24

Church, Craig E. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

Reexamination Certificate

active

06990173

ABSTRACT:
A positioning apparatus of an exposure apparatus includes a chamber, a substituting unit for substituting a gas in the chamber from a first gas to a second gas, a static pressure gas bearing provided in the chamber, a gas supply unit for supplying the second gas to the static pressure gas bearing, a control unit for controlling the gas supply unit to supply the second gas to the static pressure gas bearing when the substituting unit substitutes the gas in the chamber from the first gas to the second gas, and a bearing exhaust unit for exhausting the gas of the static pressure gas bearing.

REFERENCES:
patent: 4969168 (1990-11-01), Sakamoto et al.
patent: 5093579 (1992-03-01), Amemiya et al.
patent: 5999589 (1999-12-01), Chiba et al.
patent: 6616898 (2003-09-01), Hara et al.
patent: 2-156625 (1990-06-01), None

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