Position modulated optical reflectance measurement system...

Details Position modulated optical reflectance measurement system... Position modulated optical reflectance measurement system...

2007-05-01

2007-05-01

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

For light transmission or absorption

C356S445000

Reexamination Certificate

active

10886110

ABSTRACT:
A system for evaluating semiconductor wafers includes illumination sources for generating probe and pump beams. The pump beam is focused on the surface of a sample and a beam steering mechanism is used to modulate the point of focus in a predetermined pattern. The moving pump beam introduces thermal and plasma waves in the sample causing changes in the reflectivity of the surface of the sample. The probe beam is focused within or adjacent to the area illuminated by the pump beam. The reflected probe beam is gathered and used to measure the changes in reflectivity induced by the pump beam. By analyzing changes in reflectivity, a processor is able to deduce structure and chemical details of the sample.

REFERENCES:
patent: 4634290 (1987-01-01), Rosencwaig et al.
patent: 4636088 (1987-01-01), Rosencwaig et al.
patent: 4652757 (1987-03-01), Carver
patent: 4854710 (1989-08-01), Opsal et al.
patent: 5074669 (1991-12-01), Opsal
patent: 5206710 (1993-04-01), Geiler et al.
patent: 5228776 (1993-07-01), Smith et al.
patent: 5408327 (1995-04-01), Geiler et al.
patent: 5978074 (1999-11-01), Opsal et al.
patent: 6535285 (2003-03-01), Opsal et al.
patent: 2003/0234933 (2003-12-01), Nicolaides et al.

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