Position measurement system and lithographic apparatus

Details Position measurement system and lithographic apparatus Position measurement system and lithographic apparatus

2005-09-02

2008-03-25

Berman, Jack I. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C356S616000, C356S400000

Reexamination Certificate

active

07348574

ABSTRACT:
A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.

REFERENCES:
patent: 5523841 (1996-06-01), Nara et al.
patent: 5757160 (1998-05-01), Kreuzer
patent: 6285444 (2001-09-01), Osanai et al.
patent: 6495847 (2002-12-01), Asano et al.
patent: 6650399 (2003-11-01), Baselmans et al.
patent: 6930760 (2005-08-01), Van Elp et al.
patent: 2005/0024643 (2005-02-01), Bleeker et al.
patent: 2005/0168714 (2005-08-01), Renkens et al.
patent: 1 014 199 (2000-06-01), None
patent: 1 041 357 (2000-10-01), None
European Search Report for European Patent Application No. EP 06 07 6563, dated Dec. 8, 2006.

Affiliated with

Also associated with

Rating

Position measurement system and lithographic apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Position measurement system and lithographic apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Position measurement system and lithographic apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3978353