Position detecting apparatus

Details Position detecting apparatus Position detecting apparatus

1997-06-04

2000-08-08

Kim, Robert H.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, 250548, G01N 1100

Patent

active

061009873

ABSTRACT:
A position detecting apparatus is used with an exposure apparatus for projecting a mask pattern onto a substrate. The position detecting apparatus detects a position of an alignment mark formed on the substrate by sending light through a film having a wavelength-selective feature. The position detecting apparatus includes a light sending system for emitting the position detecting light, a wavelength changing device for adjusting a wavelength band of the position detecting light directed onto the alignment mark, on the basis of the wavelength transmittance of the film having the wavelength-selective feature, and a light receiving system for detecting the light from the alignment mark. The position of the alignment mark can be determined on the basis of a photoelectric conversion signal outputted from the light receiving system.

REFERENCES:
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5150173 (1992-09-01), Isobe et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5272501 (1993-12-01), Nishi et al.

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