Porous organosilicate layers, and vapor deposition systems...

Details Porous organosilicate layers, and vapor deposition systems... Porous organosilicate layers, and vapor deposition systems...

2011-06-14

2011-06-14

Roman, Angel (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S778000, C438S780000, C438S781000, C438S782000, C257SE21487

Reexamination Certificate

active

07960291

ABSTRACT:
The present invention provides porous organosilicate layers, and vapor deposition systems and methods for preparing such layers on substrates. The porous organosilicate layers are useful, for example, as masks.

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