Porous getter devices with reduced particle loss and method...

Details Porous getter devices with reduced particle loss and method... Porous getter devices with reduced particle loss and method...

2006-10-17

2006-10-17

Thexton, Matthew A. (Department: 1714)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192120, C204S192150, C204S192380, C427S528000, C427S531000, C419S002000

Reexamination Certificate

active

07122100

ABSTRACT:
A method for reducing the loss of particles from the surface of porous getter bodies is taught herein. The method consists in producing on the surface of the porous getter a thin layer of a metal or metal alloy with a deposition technique selected among the deposition of materials from arc generated plasma, ionic beam deposition and cathodic deposition. The deposition technique allows for granular or columnar surface of the covering material but still allowing access to the surface of the getter material, resulting in a reduced getter particle loss.

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