Polyvinylmethylphosphinic acid, process for its manufacture and

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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2041592, 430270, 430302, 526278, C08F13002

Patent

active

044580053

ABSTRACT:
The invention relates to a new phosphorus-containing polymer, polyvinylmethylphosphinic acid. It is prepared by polymerization, preferably catalytic, of vinylmethylphosphinic acid or a salt thereof. The new polymer possesses valuable properties and is used, in particular, in the production of offset printing plates which have a light-sensitive layer.

REFERENCES:
patent: 3108535 (1963-10-01), Uhlig
patent: 3276868 (1966-10-01), Uhlig
patent: 3297663 (1967-01-01), Herbst
patent: 3440050 (1969-04-01), Chu
patent: 3519607 (1970-07-01), Welch
patent: 3902976 (1975-07-01), Walls
patent: 4153461 (1979-05-01), Berghauser
patent: 4173578 (1979-11-01), Staendeke

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