Polyvinyl alcohol base photosensitive resin, photosensitive comp

Details Polyvinyl alcohol base photosensitive resin, photosensitive comp Polyvinyl alcohol base photosensitive resin, photosensitive comp

1996-12-11

1998-09-15

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430197, 525 59, 525 61, G03F 708, G03F 7038, G03F 730

Patent

active

058076573

ABSTRACT:
A polyvinyl alcohol base photosensitive resin comprised of a polyvinyl alcohol base polymer compound with the structural units of formulae (I) and (II) ##STR1## as well as a photosensitive resin composition comprising this resin and, optionally, an anionic additive and a method of forming a pattern using this photosensitive composition. R.sup.1 is a residue of a heterocyclic ring with quaternarized aromatic species, R.sup.2 is hydrogen atom or lower alkoxyl group, M is 0 or 1, and n is 1 to 6. X.sup.1, X.sup.2 are hydrogen atom, sodium, potassium or ammonium ion. These resins aid in water solubility, compatibility and sensitivity and are used in forming screen printing plates, black matrix or phosphor pattern formation of color cathode ray tubes, color filters, color printing proofs and etching resists.

REFERENCES:
patent: 4339524 (1982-07-01), Ichimura et al.
patent: 4777114 (1988-10-01), Ichimura et al.
Shibuya et al, CA 126: 150526, American Chemical Society, Columbus, Ohio, English Abstract of Japanese Patent Document, Kokai, 08-320553, Printed Dec. 3, 1996.

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