Polyvinyl acetals having imido groups and use thereof in photose

Details Polyvinyl acetals having imido groups and use thereof in photose Polyvinyl acetals having imido groups and use thereof in photose

1999-10-14

2000-07-11

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430909, 430926, 4302831, 430302, 525 58, 525 61, 522 26, 522 27, 522 53, 522166, 427510, 427514, G03C 173, G03C 172, G03C 174, C08G 400, C08J 328

Patent

active

060870664

ABSTRACT:
This invention relates to polyvinyl acetals containing the units A, B, C and D, wherein
A is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula ##STR4## wherein n is an integer from 1 to 3 and

REFERENCES:
patent: 2179051 (1939-11-01), Morrison et al.
patent: 3732106 (1973-05-01), Steppan et al.
patent: 4102686 (1978-07-01), Weinberger et al.
patent: 4123276 (1978-10-01), Kita et al.
patent: 4304832 (1981-12-01), Ohta et al.
patent: 4387151 (1983-06-01), Bosse et al.
patent: 4731316 (1988-03-01), Tomiyasu et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4877711 (1989-10-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski
patent: 4950582 (1990-08-01), Aoai et al.
patent: 4983491 (1991-01-01), Aoai et al.
patent: 5100957 (1992-03-01), Oshima et al.
patent: 5112743 (1992-05-01), Kamiya et al.
patent: 5169897 (1992-12-01), Walls
patent: 5219699 (1993-06-01), Walls et al.
patent: 5260161 (1993-11-01), Matsumura et al.
patent: 5330877 (1994-07-01), Curtis
patent: 5616449 (1997-04-01), Cheng et al.
patent: 5925491 (1999-07-01), Baumann et al.
Baumann et al., "Chemical Aspects of Offset Printing", J. prakt. Chem./Chemiker-Zeitung (Journal for Chemists) 336 (1994), pp. 336-377.

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