Polysulfone barrier layer for bi-level photoresists

Details Polysulfone barrier layer for bi-level photoresists Polysulfone barrier layer for bi-level photoresists

1988-02-12

1989-05-30

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430326, 430328, 430156, 430166, 430325, G03C 152, G03C 168, G03C 186, G03C 194

Patent

active

048350869

ABSTRACT:
A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.

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IBM Technical Disclosure Bulletin, vol. 26, No. 11, Apr. 1984, p. 6141.

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