Polystyrene as a resist for making patterned media

Details Polystyrene as a resist for making patterned media Polystyrene as a resist for making patterned media

2005-01-04

2005-01-04

Chea, Thorl (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S296000, C427S129000, C427S130000, C427S131000, C427S132000, C427S259000, C427S261000, C427S264000, C427S265000, C427S272000, C427S282000, C427S299000, C427S355000, C427S404000, C427S407100, C428S221000, C428S457000, C428S693100, C428S699000, C428S900000

Reexamination Certificate

active

06838227

ABSTRACT:
A system and method for forming servo patterns on magnetic media is disclosed. A magnetic film coated with a layer of polystyrene is stamped with a nickel stamper reproducing the negative image of the stamped pattern on the polystyrene. Ions are then accelerated towards the surface of the polystyrene, which stopps the ions in the areas where the polystyrene is thick and allows the ions to penetrate through to the magnetic layer in the areas where the polystyrene is thin. The ions, which penetrate through to the magnetic layer, interact with the magnetic layer altering the magnetic layer's structure reducing its coercivity (Hc) and remnant moment (Mrt). This reproduces the stamped polystyrene pattern on the magnetic layer. The polystyrene is then removed by oxygen plasma etching the surface leaving behind a patterned magnetic media.

REFERENCES:
patent: 5258267 (1993-11-01), Maruyama
patent: 5707859 (1998-01-01), Miller et al.
patent: 5772905 (1998-06-01), Chou
patent: 6190929 (2001-02-01), Wang et al.
patent: 6197399 (2001-03-01), Naito et al.
patent: 6617012 (2003-09-01), Wang et al.
U.S. Appl. No. 10/112,192, filed Mar. 29, 2002, Wang.
J.A. Brydson, “Plastics Materials”, 6th edition, Butterworth-Heinemann, 1995 p78 and p94, United Kingdom.

Affiliated with

Also associated with

Rating

Polystyrene as a resist for making patterned media does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polystyrene as a resist for making patterned media, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polystyrene as a resist for making patterned media will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3420317