Polysiloxane pattern-forming material with SiO.sub.4/2 units and

Details Polysiloxane pattern-forming material with SiO.sub.4/2 units and Polysiloxane pattern-forming material with SiO.sub.4/2 units and

1988-11-07

1991-01-15

McCamish, Marion C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430281, 430325, 430313, 522 99, G03C 172, G03F 7075

Patent

active

049853422

ABSTRACT:
Pattern-forming material useful in producing highly accurate submicron patterns having unusually high aspect ratios at superior resolutions are obtained by using a solvent-soluble polyorganosiloxane having SiO.sub.4/2 units and at least one other organosiloxane unit which contains a high energy radiation sensitive group. The polyorganosiloxane has a softening temperature greater than room temperature.

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patent: 4579789 (1985-07-01), Kroupa
patent: 4677161 (1987-06-01), Suzuki et al.
patent: 4722881 (1988-02-01), Ueno et al.
patent: 4786701 (1988-11-01), Tanaka
patent: 4839109 (1989-06-01), Kaetsu et al.
patent: 4861807 (1989-08-01), Preiner et al.
patent: 4863833 (1989-09-01), Fukuyama et al.
patent: 4889905 (1989-12-01), Suzuki

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