Polysilane type photosensitive resin composition and method for

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430326, 430920, 522 24, 522 26, 522148, G03C 173, C08J 328

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active

057767645

ABSTRACT:
The present invention provides a photosensitive resin composition wherein a sensitiveness of polysilane to photodegradation is improved and a time required for photodegradation is short. The photosensitive resin composition comprises:

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Wallraff et al., Polym. Mat. Sci. Eng., "Sensitive Polysilane Resists for Bilayer Lithography", vol. 66, 1992, pp. 104-109.

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