Polyorganosiloxane, resin composition, and patterning process

Details Polyorganosiloxane, resin composition, and patterning process Polyorganosiloxane, resin composition, and patterning process

2009-04-24

2011-11-01

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S331000, C430S913000

Reexamination Certificate

active

08048611

ABSTRACT:
A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.

REFERENCES:
patent: 5143816 (1992-09-01), Mizutani et al.
patent: 6309796 (2001-10-01), Nakashima et al.
patent: 6730453 (2004-05-01), Nakashima et al.
patent: 6939667 (2005-09-01), Taima
patent: 7132220 (2006-11-01), Arai et al.
patent: 7439010 (2008-10-01), Watanabe et al.
patent: 7625687 (2009-12-01), Hu et al.
patent: 2003/0114581 (2003-06-01), Bowen, III et al.
patent: 2003/0191268 (2003-10-01), Iwasawa et al.
patent: 2003/0224286 (2003-12-01), Barclay et al.
patent: 2009/0068586 (2009-03-01), Nakamura et al.
patent: 2009/0293858 (2009-12-01), Krasznai
patent: 2010/0071818 (2010-03-01), Hergenrother et al.
patent: 3-059667 (1991-03-01), None
patent: 3-175514 (1991-07-01), None
patent: 7-098502 (1995-04-01), None
patent: 8-160623 (1996-06-01), None
patent: 11-060733 (1999-03-01), None
patent: 2003-255546 (2003-09-01), None
patent: 2004-240144 (2004-08-01), None
patent: 2007-041361 (2007-02-01), None
Machine translation of JP 08-160623 (no date).
European Search Report dated Aug. 19, 2009, issued in corresponding European Patent Application No. 09251181.5.
Shostakovskii, M.F. et al.; “Synthesis and transformations of oxygen-containing silicoorganic compounds. Synthesis of methyl, ethyl, and isopropyl triethylsilano acetals”; Database CA [Online], Chemical Abstracts Service, Apr. 22, 2001, XP002540191 retrieved from STN Database accession No. 1955: 7872 Columbus, Ohio.
Y. Kawai et al, “Characteristics of a Chemically Amplified Silicone-Based Negative Resist (CSNR) in KrF Excimer Laser Litography”, Advances in Resist Technology and Processing, 1992, pp. 56-65, vol. 1672.

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