Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – At least one aryl ring which is part of a fused or bridged...
Patent
1992-02-12
1993-08-10
Michl, Paul R.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
At least one aryl ring which is part of a fused or bridged...
524612, 524220, 524376, 524221, 524233, 524241, 524261, 524284, 524726, 524731, 524755, 524770, 524773, C08J 300, C08K 536, C08L 8100
Patent
active
052349900
ABSTRACT:
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
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patent: 5110697 (1992-05-01), Lamb, III et al.
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Legenza et al., "A New Class of Bilevel and Mono-level Positive Resist Systems Based on a Chemically Stable Imide Polymer", SPIE Proc., vol. 539, p. 250 (1985).
A. Jeffries et al., "Two Anti-Reflective Coatings for Use Over Highly Reflective Topography", SPIE Proceedings, vol. 539, p. 342 (1985).
W. Ishii et al., "Anti-Reflective Coating Material for Highly Reflective Surfaces with Topography", SPIE vol. 631, p. 295 (1986).
T. Tanaka et al., "A New Photolithography Technique with Antireflective Coating on Resist: ARCOR", J. Electrochem. Soc., vol. 137, p. 3900 (1990).
A. Yen, "Fabrication of Large-Area 100 nm-Period Gratings using Achromatic Holographic Lithography", (1991).
Brewer Terry
Flaim Tony
Lamb, III James
Moeckli Kimberly A.
Brewer Science Inc.
Michl Paul R.
Peoples, Jr. Veo
Rajguru U. K.
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