Polymers, resist compositions and patterning process

Details Polymers, resist compositions and patterning process Polymers, resist compositions and patterning process

2005-03-08

2005-03-08

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S330000, C430S907000, C430S910000, C526S242000, C526S282000, C526S319000, C524S558000

Reexamination Certificate

active

06864037

ABSTRACT:
A copolymer of an acrylic monomer having at least one C6-20alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.

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