Polymers and photoresist compositions for short wavelength...

Details Polymers and photoresist compositions for short wavelength... Polymers and photoresist compositions for short wavelength...

2005-01-18

2005-01-18

Everhart, Caridad (Department: 2825)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S780000, C438S948000, C438S725000

Reexamination Certificate

active

06844270

ABSTRACT:
The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.

REFERENCES:
patent: 5731364 (1998-03-01), Sinta et al.
patent: 5916995 (1999-06-01), Park et al.
patent: 6133412 (2000-10-01), Malik et al.
patent: 6277750 (2001-08-01), Pawlowski et al.
patent: 6495298 (2002-12-01), Fujishiro et al.
patent: 6541181 (2003-04-01), Levanon et al.

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