Polymers and photoresist compositions comprising same

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S271100, C430S272100, C430S326000, C430S905000, C430S910000, C526S256000, C526S266000, C526S269000, C526S270000, C526S271000

Reexamination Certificate

active

06849376

ABSTRACT:
The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

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