Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-02-28
2010-11-23
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000
Reexamination Certificate
active
07838199
ABSTRACT:
The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
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patent: 7078147 (2006-07-01), Harada et al.
patent: 7125641 (2006-10-01), Harada et al.
patent: 7459261 (2008-12-01), Hatakeyama et al.
Nassar Roger A.
Thackeray James W.
Chu John S
Corless Peter F.
Edwards Angell Palmer & & Dodge LLP
Frickey Darryl P.
Rohm and Haas Electronic Materials LLC
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