Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-09-13
2000-07-18
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430176, 430192, 4302701, 4302871, G03F 7039
Patent
active
060905263
ABSTRACT:
The present invention provides novel polymers and photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include repeating units that contain an acetalester or ketalester moiety. Preferred photoresists of the invention are chemically-amplified positive-acting compositions that contain a polymer with acetalester or ketalester unit as a resin binder component and that can react to provide solubility differences in the presence of photo-generated acid.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 4968581 (1990-11-01), Wu et al.
patent: 5072029 (1991-12-01), Hertler
patent: 5075199 (1991-12-01), Schwalm et al.
patent: 5085972 (1992-02-01), Vogel
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5120633 (1992-06-01), Bauer et al.
patent: 5206317 (1993-04-01), Hertler et al.
patent: 5212047 (1993-05-01), Hertler et al.
patent: 5219711 (1993-06-01), Anderson et al.
patent: 5252427 (1993-10-01), Bauer et al.
patent: 5262281 (1993-11-01), Bauer et al.
patent: 5861231 (1999-01-01), Barclay et al.
English translation of Tangetal (EP 0689098) United States Patent Office, Aug. 1998, 39 pages.
Hertler, et al., "Synthesis and Applications of Acid-Labile Acrylic Polymers", Makromol. Chem., Macromol. Symp. 64, pp. 137-149, 1992.
Kikuchi, et al., "Positive Chemical Amplification Resist for Deep UV Lithography", Journal of Photopolymer Science and Technology, vol. 4, No. 3, pp. 357-360, 1991.
Raymond, et al., "A Negative-Wroking Tonable Photoimaging Composition Based on Acid-Labile Acrylic Polymers", Journal of Imaging Science and Technology, vol. 36, No. 3, pp. 243-248, 1992.
Cairns S. Matthew
Corless Peter F.
Frickey Darryl P.
Hamilton Cynthia
Shipley Company L.L.C.
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