Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-01-26
2000-12-05
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430910, 526313, G03F 7004
Patent
active
06156477&
ABSTRACT:
A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is H, R.sup.4 is --COOR.sup.5, C.sub.1 -C.sub.5 alkyl or phenyl, or R.sup.3 and R.sup.4, taken together, may form --COOCO--, R.sup.5 is H or C.sub.1 -C.sub.8 alkyl, x and y are integers satisfying x+y.ltoreq.5, p and q are positive numbers satisfying p+q=1 and 0<q/(p+q).ltoreq.0.9. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity and resolution and forms resist patterns having plasma etching resistance, heat resistance, overhang prevention, and dimensional controllability.
REFERENCES:
patent: 4845008 (1989-07-01), Nishioka et al.
patent: 5712078 (1998-01-01), Huang et al.
patent: 5942367 (1999-08-01), Watanabe et al.
JP-A 814660 (English abstract).
JP-A 6100488 (English abstract).
JP-A 4211258 (English abstract).
JP-A 3223858 (English abstract).
JP-A 62115440 (English abstract).
JP-A 6327829 (English abstract).
JP-B 227660 (English abstract).
Ishihara Toshinobu
Motomi Kiyoshi
Nagura Shigehiro
Watanabe Osamu
Watanabe Satoshi
Chu John S.
Shin-Etsu Chemical Co. , Ltd.
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