Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-23
2007-10-23
Kelly, Cynthia H. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C526S286000, C526S319000, C526S310000, C526S242000
Reexamination Certificate
active
10864424
ABSTRACT:
Novel ester compounds having a sulfonamide structure are polymerizable into polymers having improved transparency at wavelength of up to 300 nm, especially ArF excimer laser light, and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
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Kinsho Takeshi
Watanabe Takeru
Birch & Stewart Kolasch & Birch, LLP
Johnson Connie P.
Kelly Cynthia H.
Shin-Etsu Chemical Co. , Ltd.
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